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Updated: May 29, 2026

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
Published on: July 17, 2020
Electronic versus lattice match for metal-semiconductor epitaxial growth: Pb on Ge(111)
S-J Tang1, Chang-Yeh Lee, Chien-Chung Huang
1Department of Physics, National Tsing Hua University, Hsinchu, Taiwan. sjtang@phys.nthu.edu.tw
Abstract:
Lattice match is important for epitaxial growth. We show that a competing mechanism, electronic match, can dominate at small film thicknesses for metal-semiconductor systems, where quantum confinement and symmetry requirements may favor a different growth pattern. For Pb(111) on Ge(111), an accidental lattice match leads to a √3 × √3 configuration involving a 30° in-plane rotation at large film thicknesses, but it gives way to an incommensurate (1 × 1) configuration at small film thickness. The transformation follows an approximately inverse-film-thickness dependence with superimposed bilayer oscillations.
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