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Efficient silicon wire waveguide crossing with negligible loss and crosstalk
1AV Rzhanov Institute of Semiconductor Physics SB RAS, Prospect Lavrenteva 13, Novosibirsk 630090, Russia. tsarev@.isp.nsc.ru
Optics Express
|September 22, 2011
Summary
This study presents an efficient silicon wire waveguide crossing. The novel design achieves high efficiency and low signal loss, enabling advanced photonic integrated circuits.
Area of Science:
- Photonics and Optical Engineering
- Materials Science
- Electrical Engineering
Background:
- Optical waveguides are crucial components in integrated photonic circuits.
- Efficient waveguide crossings are essential for complex optical routing and signal processing.
- Existing waveguide crossing designs often suffer from significant insertion loss and crosstalk.
Purpose of the Study:
- To introduce a novel, highly efficient silicon wire waveguide crossing design.
- To demonstrate the feasibility of vertical coupling between silicon wire and polymer waveguides.
- To provide a CMOS-compatible solution for advanced photonic applications.
Main Methods:
- Utilizing vertical coupling of tapered silicon wire waveguides with upper polymer wide strip waveguides.
- Employing a silica buffer layer to facilitate efficient optical power transfer.
- Performing numerical simulations using the 3D Finite-Difference Time-Domain (FDTD) method to optimize the structure.
Main Results:
- Achieved 98% efficiency for the through-pass signal.
- Achieved 99.9% efficiency for the cross-pass signal.
- Demonstrated negligible back reflection (-50 dB) and crosstalk (-70 dB) in the optimized 70 µm structure.
Conclusions:
- The proposed silicon wire waveguide crossing offers superior performance metrics.
- This design is compatible with existing Complementary Metal-Oxide-Semiconductor (CMOS) fabrication processes.
- The efficient waveguide crossing has significant potential for various applications in silicon photonics and integrated optics.
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