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Increased process latitude in absorbance-modulated lithography via a plasmonic reflector
Charles W Holzwarth1, John E Foulkes, Richard J Blaikie
1MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer Engineering, University of Christchurch, Christchurch, New Zealand.
Optics Express
|September 22, 2011
Summary
Absorbance-modulated lithography uses photochromic molecules for subwavelength patterning. Integrating TM polarization and a plasmonic reflector significantly enhances process latitude by up to 66%.
Area of Science:
- Optics and Photonics
- Materials Science
- Nanotechnology
Background:
- Absorbance-modulated lithography is an optical patterning technique utilizing photochromic molecules.
- It enables subwavelength resolution by creating an absorption mask with patterned wavelengths.
- Current limitations include poor process latitude due to limited contrast and depth-of-focus.
Purpose of the Study:
- To improve the process latitude of absorbance-modulated lithography.
- To investigate the impact of TM polarization and plasmonic reflectors on lithographic performance.
Main Methods:
- Utilized TM polarization for the transparent wavelength (λ1) illumination.
- Integrated a plasmonic reflector into the lithographic setup.
- Analyzed the effects on contrast, depth-of-focus, and overall process latitude.
Main Results:
- Achieved a significant increase in process latitude, up to 66%.
- Demonstrated the effectiveness of combining TM polarization with a plasmonic reflector.
- Overcame limitations of contrast and depth-of-focus inherent in the original method.
Conclusions:
- The integration of TM polarization and plasmonic reflectors is a viable strategy to enhance absorbance-modulated lithography.
- This approach substantially improves process latitude, making the technique more robust.
- Opens avenues for more reliable subwavelength patterning applications.
