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Related Concept Videos

Metal-Semiconductor Junctions01:24

Metal-Semiconductor Junctions

The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
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Updated: May 29, 2026

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
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Improved screening ability of ferroelectric-semiconductor interface.

Maxim Y Gureev1, Alexander K Tagantsev, Nava Setter

  • 1Ceramics Laboratory, Swiss Federal Institute of Technology (EPFL), Lausanne, Switzerland. maxim.gureev@epfl.ch

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
|September 23, 2011
PubMed
Summary

Integrating ferroelectrics on silicon is promising, but thin film instability is a challenge. Built-in potential in semiconductors can improve interface screening, enhancing ferroelectric device stability.

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Area of Science:

  • Materials Science
  • Condensed Matter Physics
  • Semiconductor Physics

Background:

  • Ferroelectric-semiconductor devices offer novel functionalities.
  • Thin ferroelectric films on semiconductors face instability issues.
  • Interface screening significantly impacts ferroelectric state stability.

Purpose of the Study:

  • To investigate the role of built-in potential in ferroelectric-semiconductor interfaces.
  • To understand how to enhance the stability of thin ferroelectric films on silicon.
  • To explore material selection strategies for improved device performance.

Main Methods:

  • Theoretical analysis of interface screening mechanisms.
  • Modeling the influence of semiconductor built-in potential.
  • Investigating the dependence on electron affinities and surface states.

Main Results:

  • Built-in potential in semiconductors strongly influences interface screening.
  • This built-in potential can stabilize the ferroelectric state in thin films.
  • Screening ability is controllable via material choice, affecting electron affinities and surface states.

Conclusions:

  • Semiconductor built-in potential is a critical factor for stable ferroelectric-semiconductor integration.
  • Careful material selection offers a pathway to control interface properties and enhance device stability.
  • This work provides insights for designing robust ferroelectric-semiconductor devices.