Metal-Semiconductor Junctions
Fermi Level Dynamics
Biasing of Metal-Semiconductor Junctions
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Updated: May 29, 2026

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Maxim Y Gureev1, Alexander K Tagantsev, Nava Setter
1Ceramics Laboratory, Swiss Federal Institute of Technology (EPFL), Lausanne, Switzerland. maxim.gureev@epfl.ch
Integrating ferroelectrics on silicon is promising, but thin film instability is a challenge. Built-in potential in semiconductors can improve interface screening, enhancing ferroelectric device stability.
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