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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Analysis of electronic states and energy level structure of uranyl in compounds

G K Liu1

  • 1Chemical Sciences and Engineering Division, Argonne National Laboratory, Argonne, Illinois 60439, United States.

The Journal of Physical Chemistry. A
|September 24, 2011
PubMed

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