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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

Structural studies coupling X-ray diffraction and high-energy X-ray scattering in the UO2(2+)-HBr(aq) system

Richard E Wilson1, S Skanthakumar, C L Cahill

  • 1Chemical Sciences and Engineering Division, Argonne National Laboratory, Argonne, Illinois 60439, USA. rewilson@anl.gov

Inorganic Chemistry
|September 28, 2011
PubMed

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