Search research articles

ABOUT JoVE

Overview Leadership Blog JoVE Help Center

AUTHORS

Publishing Process Editorial Board Scope & Policies Peer Review FAQ Submit

LIBRARIANS

Testimonials Subscriptions Access Resources Library Advisory Board FAQ

RESEARCH

JoVE Journal Methods Collections JoVE Encyclopedia of Experiments Archive

EDUCATION

JoVE Core JoVE Business JoVE Science Education JoVE Lab Manual Faculty Resource Center Faculty Site

Terms & Conditions of Use

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by

Same author

Cross-ancestry pleiotropic analysis of imaging-derived phenotypes enhances risk stratification of depression.

Molecular psychiatry·2026

Same author

Lighting effects on optimal facial regions for remote heart rate measurement.

NPJ cardiovascular health·2026

Same author

Image Restoration Learning via Noisy Supervision in Fourier Domain.

IEEE transactions on image processing : a publication of the IEEE Signal Processing Society·2026

Same author

EventTracer: Fast Path Tracing-Based Event Stream Rendering.

IEEE transactions on visualization and computer graphics·2026

Same author

Genome-Wide Association Study and Fine Mapping Uncover Key Genetic Loci and Credible Genes of Intracranial Aneurysm and Aneurysmal Subarachnoid Hemorrhage.

Stroke·2026

Same author

Seasonal Divergence between Microbiomes on Microplastics and Natural Particles Increases with Rising Water Temperatures in Urban Rivers.

Environmental science & technology·2026

Same journal

Denoising algorithm of Φ-OTDR systems based on adaptive fractional wavelet transform denoising.

Optics express·2026

Same journal

Millisecond photon-to-photon latency and high-speed volumetric projection system for optogenetics.

Optics express·2026

Same journal

Polarization-encoded coaxial structured light for high-precision 3D surface profilometry.

Optics express·2026

Same journal

Discrete freeform optical design based on collaborative optimization of point cloud and local normals.

Optics express·2026

Same journal

Ultrafast ghost imaging with 25 GHz speckle switching and wavelength-division multiplexing.

Optics express·2026

Same journal

Atomic vapor cells fabricated by femtosecond laser welding of standard-optical-quality glass.

Optics express·2026

See all related articles

Search research articles

Related Experiment Video

Updated: May 28, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Pixelated source mask optimization for process robustness in optical lithography.

Ningning Jia¹, Edmund Y Lam

¹Imaging Systems Laboratory, Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong.

|October 15, 2011

Summary

This summary is machine-generated.

This study introduces pixelated source-mask optimization (SMO) to improve lithography resolution. By incorporating statistical variations, this method enhances process robustness for smaller circuit patterns.

More Related Videos

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Published on: January 27, 2017

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

Related Experiment Videos

Last Updated: May 28, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

Published on: January 27, 2017

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

Area of Science:

Semiconductor Manufacturing
Optical Engineering
Computational Lithography

Background:

Optical lithography is crucial for semiconductor manufacturing, enabling smaller circuit patterns.
Shrinking feature sizes exacerbate lithographic process variations, impacting yield and reliability.
Source-Mask Optimization (SMO) offers a path to higher resolution by co-designing source and mask patterns.

Purpose of the Study:

To develop a robust pixelated Source-Mask Optimization (SMO) technique.
To explicitly incorporate statistical process variations into the SMO framework.
To enhance the process robustness of optical lithography for advanced semiconductor nodes.

Main Methods:

Developed a pixelated Source-Mask Optimization (SMO) approach.
Utilized inverse imaging principles for optimization.
Integrated explicit modeling of statistical variations within the optimization framework.

Main Results:

Demonstrated the efficacy of the proposed pixelated SMO method through simulations.
Showcased significant enhancement in process robustness.
Validated the ability to achieve higher resolution imaging with improved variation tolerance.

Conclusions:

Pixelated SMO with explicit variation incorporation is effective for improving lithographic process robustness.
This approach addresses critical challenges in manufacturing advanced semiconductor devices.
The developed method provides a viable strategy for next-generation lithography design.