Feasibility studies: UV/chlorine advanced oxidation treatment for the removal of emerging contaminants

UV/chlorine (UV/HOCl and UV/ClO(2)) Advanced Oxidation Processes (AOPs) were assessed with varying process layout and compared to the state of the art UV/H(2)O(2) AOP. The process comparison focused on the economical and energy saving potential of the UV/chlorine AOP. Therefore the experiments were performed at technical scale (250 L/h continuous flow reactor) and at process energies, oxidant and model contaminant concentrations expected in full scale reference plants. As model compounds the emerging contaminants (ECs): desethylatrazine, sulfamethoxazole, carbamazepine, diclofenac, benzotriazole, tolyltriazole, iopamidole and 17α-ethinylestradiol (EE2) were degraded at initial compound concentrations of 1 μg/L in tap water and matrixes with increased organic load (46 mg/L DOC). UV/chlorine AOP organic by-product forming potential was assessed for trihalomethanes (THMs) and N-Nitrosodimethylamine (NDMA). A process design was evaluated which can considerably reduce process costs, energy consumption and by-product generation from UV/HOCl AOPs.