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Updated: May 27, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
08:12

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures

Published on: December 5, 2015

A difference in using atomic layer deposition or physical vapour deposition TiN as electrode material in

A W Groenland1, R A M Wolters, A Y Kovalgin

  • 1MESA+ Institute for Nanotechnology, Chair of Semiconductor Components, University of Twente, 7500 AE Enschede, The Netherlands.

Journal of Nanoscience and Nanotechnology
|November 22, 2011
PubMed

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