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Updated: May 27, 2026

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Published on: July 2, 2012
Meniscus lithography: evaporation-induced self-organization of pillar arrays into moiré patterns
Sung H Kang1, Ning Wu, Alison Grinthal
1School of Engineering and Applied Sciences and Kavli Institute for Bionano Science and Technology, Harvard University, Cambridge, Massachusetts 02138, USA.
Abstract:
We demonstrate a self-organizing system that generates patterns by dynamic feedback: two periodic surfaces collectively structure an intervening liquid sandwiched between them, which then reconfigures the original surface features into moiré patterns as it evaporates. Like the conventional moiré phenomenon, the patterns are deterministic and tunable by mismatch angle, yet additional behaviors-chirality from achiral starting motifs and preservation of the patterns after the surfaces are separated-emerge uniquely from the feedback process. Patterning menisci based on this principle provides a simple, scalable approach for making a series of complex, long-range-ordered structures.

