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Related Experiment Video

Updated: May 27, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities

Published on: July 24, 2015

Nanometer-scale lithography on microscopically clean graphene.

W F van Dorp¹, X Zhang, B L Feringa

¹Materials Science, Zernike Institute for Advanced Materials, University of Groningen, Nijenborg 4, 9747 AG Groningen, The Netherlands. w.f.van.dorp@rug.nl

|November 24, 2011

Summary

This summary is machine-generated.

Focused-electron-beam-induced deposition (FEBID) on graphene reveals crucial insights into early metal growth stages. Preferential adsorption on graphene step edges dictates initial deposition patterns for nanoscale fabrication.

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Last Updated: May 27, 2026

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Published on: July 24, 2015

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Published on: September 14, 2018

Area of Science:

Materials Science
Nanotechnology
Surface Science

Background:

Focused-electron-beam-induced deposition (FEBID) is a nanofabrication technique.
The initial deposition stages in FEBID are not well understood.
Graphene is an ideal substrate for studying nanoscale deposition due to its unique properties.

Purpose of the Study:

To investigate the early growth phase of FEBID on few-layer graphene.
To fabricate nanoscale patterns with dimensions ranging from 0.6 to 5 nm.
To compare FEBID deposition behavior on graphene with that on amorphous materials.

Main Methods:

Utilized exfoliated few-layer graphene as a substrate.
Developed a method to clean graphene surfaces, removing amorphous material.
Employed tungsten hexacarbonyl (W(CO)6) as the precursor for FEBID.

Main Results:

Successfully fabricated patterns with dimensions between 0.6 and 5 nm on graphene.
Observed that precursor molecule adsorption on step edges and adsorbates is critical for deposition.
Demonstrated the importance of substrate cleaning for controlled FEBID experiments.

Conclusions:

Preferential adsorption mechanisms significantly influence FEBID initial growth on cleaned graphene.
This study provides fundamental understanding for optimizing FEBID processes on 2D materials.
The findings contribute to advancing nanoscale fabrication techniques using graphene substrates.