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Photoelectron Imaging of Anions Illustrated by 310 Nm Detachment of F−

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Dissociative electron attachment to triflates.

Sylwia Ptasińska¹, David Gschliesser, Peter Bartl

¹Radiation Laboratory and Department of Physics, University of Notre Dame, Notre Dame, Indiana 46556, USA. sptasins@nd.edu

The Journal of Chemical Physics

|December 14, 2011

Summary

This summary is machine-generated.

Dissociative electron attachment to triflates reveals distinct fragmentation pathways for alkyl and aryl molecules. Understanding these electron-induced bond scissions is crucial for photoacid generator applications in lithography.

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Area of Science:

Physical Chemistry
Materials Science
Organic Chemistry

Background:

Triflates are model molecules for nonionic photoacid generators used in advanced lithography.
Understanding their fragmentation under electron impact is key to optimizing lithographic processes.

Purpose of the Study:

To investigate the gas-phase dissociative electron attachment pathways of simple alkyl and aryl triflates.
To identify major dissociation channels and anion formation under electron impact below 10 eV.

Main Methods:

Utilized crossed electron-molecular beam mass spectrometry.
Analyzed fragmentation patterns resulting from electron impact on triflate molecules.

Main Results:

Identified major dissociation channels involving C-O, S-O, and C-S bond scissions, yielding triflate (OTf(-)), triflyl (Tf(-)), and sulfonate (RSO(3)(-)) anions.
Observed lower electron energies for C-O bond cleavage in alkyl triflates compared to aryl triflates.
Noted that S-O bond cleavage in aryl triflates occurred at similar electron energies as C-O bond cleavage, unlike in alkyl triflates.

Conclusions:

The study elucidates the specific fragmentation mechanisms of alkyl and aryl triflates under electron attachment.
Findings provide insights into the stability and reactivity of these molecules, relevant for photoacid generator design in lithography.