Substrate suppression of thermal roughness in stacked supported bilayers

Curt M DeCaro1, Justin D Berry, Laurence B Lurio

  • 1Department of Physics, Northern Illinois University, DeKalb, Illinois 60115, USA.

Summary

We studied 1,2-dipalmitoyl-sn-3-phosphatidylethanolamine (DPPE) bilayers on silicon. Substrate proximity reduced bilayer spacing and roughness by suppressing fluctuations and Helfrich repulsion.

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