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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Fundamental proximity effects in focused electron beam induced deposition

Harald Plank1, Daryl A Smith, Thomas Haber

  • 1Institute for Electron Microscopy, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria. harald.plank@felmi-zfe.at

ACS Nano
|December 21, 2011
PubMed
Summary

Optimizing electron beam induced deposition (EBID) on nonflat surfaces involves adjusting scanning pitch and patterning sequences. These strategies significantly boost volumetric growth rates for nanoscale direct write applications.

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