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Related Experiment Video

Updated: May 26, 2026

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
09:45

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Published on: June 12, 2018

Maskless multiple-beam laser lithography for large-area nanostructure/microstructure fabrication.

Min Tang1, Zai Chun Chen, Zhi Qiang Huang

  • 1Department of Electrical and Computer Engineering, National University of Singapore, 117576 Singapore.

Applied Optics
|December 24, 2011
PubMed
Summary

A novel maskless laser lithography method enables rapid, large-area fabrication of diverse nanostructures and microstructures. This technique offers precise control over feature size and can create complex patterns for various applications.

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Last Updated: May 26, 2026

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
09:45

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Published on: June 12, 2018

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Area of Science:

  • Materials Science
  • Nanotechnology
  • Optical Engineering

Background:

  • Traditional lithography techniques often face limitations in speed and scalability for large-area fabrication.
  • The demand for precise, arbitrary nanostructure and microstructure fabrication is increasing across various scientific and industrial fields.

Purpose of the Study:

  • To report a maskless multiple-beam laser lithography technique for high-speed, large-area nanostructure/microstructure fabrication.
  • To demonstrate the flexibility and control offered by this technique in generating diverse and complex patterns.
  • To explore the application potential of fabricated structures in areas like metamaterials and soft lithography.

Main Methods:

  • Utilized a maskless multiple-beam laser lithography system.
  • Controlled feature size by adjusting exposure time and nanostage moving speed.
  • Employed single- and double-exposure schemes for creating hybrid nanostructures and tuning plasmonic properties.
  • Fabricated 2.5D microstructures on silicon substrates for mold tooling.

Main Results:

  • Achieved flexible and high-speed fabrication of arbitrary nanostructures/microstructures over large areas.
  • Demonstrated the ability to create functional patterns, including split-ring resonator metamaterials for terahertz waves.
  • Successfully produced complex hybrid nanostructures and tuned surface plasmonic resonance.
  • Fabricated 2.5D microstructures suitable for soft lithography applications.

Conclusions:

  • The developed maskless multiple-beam laser lithography technique is a versatile tool for advanced nanostructure and microstructure fabrication.
  • This technology offers significant advantages in speed, scalability, and pattern complexity for diverse applications.
  • The ability to create functional metamaterials and 2.5D microstructures highlights the broad potential of this fabrication method.