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Autostratification in drying colloidal dispersions: effect of particle interactions
Anand K Atmuri1, Surita R Bhatia, Alexander F Routh
1Department of Chemical Engineering & Biotechnology and BP Institute, University of Cambridge, Madingley Rise, Cambridge CB3 0EZ, United Kingdom.
Particle interactions significantly influence vertical segregation in dried films, impacting particle distribution beyond evaporation and diffusion rates. This study explores these effects in various charged particle systems.
Area of Science:
- Materials Science
- Physical Chemistry
- Colloid Science
Background:
- Vertical segregation of particles during film casting is a common issue, influenced by factors like particle size, charge, and drying rates (Peclet number).
- Previous models, such as Trueman et al.'s, have explored particle segregation, often simplifying chemical potential calculations.
- Understanding particle interactions is key to controlling particle distribution in thin films.
Purpose of the Study:
- To investigate the role of particle interactions in vertical segregation during film drying.
- To analyze the behavior of charged particles with varying and identical Peclet numbers.
- To experimentally validate theoretical predictions regarding particle segregation.
Main Methods:
- Numerical modeling of particle segregation, considering entropy-driven chemical potentials.
- Systematic variation of Peclet numbers and particle charges in theoretical models.
- Experimental casting of films with particles having Peclet numbers around unity.
Main Results:
- Particle interactions were shown to be a critical factor in vertical segregation, alongside the Peclet number.
- Theoretical models predicted distinct segregation behaviors for charged particles with different and same Peclet numbers.
- Experimental results aligned with theoretical predictions for systems where Peclet numbers straddled unity.
Conclusions:
- Particle interactions are a dominant factor in vertical segregation during film formation.
- The Peclet number and particle charge interplay significantly affects particle distribution.
- The study provides a validated framework for predicting and controlling particle segregation in thin films.
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