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Updated: May 26, 2026

Developing High Performance GaP/Si Heterojunction Solar Cells
Published on: November 16, 2018
A novel method for crystalline silicon solar cells with low contact resistance and antireflection coating by an
Jonghwan Lee1, Youn-Jung Lee, Minkyu Ju
1School of Information and Communication Engineering, Sungkyunkwan University, Suwon, 440-746, South Korea. yi@yurim.skku.ac.kr.
Abstract:
One of the key issues in the solar industry is lowering dopant concentration of emitter for high-efficiency crystalline solar cells. However, it is well known that a low surface concentration of dopants results in poor contact formation between the front Ag electrode and the n-layer of Si. In this paper, an evaporated Mg layer is used to reduce series resistance of c-Si solar cells. A layer of Mg metal is deposited on a lightly doped n-type Si emitter by evaporation. Ag electrode is screen printed to collect the generated electrons. Small work function difference between Mg and n-type silicon reduces the contact resistance. During a co-firing process, Mg is oxidized, and the oxidized layer serves as an antireflection layer. The measurement of an Ag/Mg/n-Si solar cell shows that Voc, Jsc, FF, and efficiency are 602 mV, 36.9 mA/cm2, 80.1%, and 17.75%, respectively. It can be applied to the manufacturing of low-cost, simple, and high-efficiency solar cells.
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