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Related Concept Videos

Atomic Force Microscopy01:08

Atomic Force Microscopy

Atomic force microscopy (AFM) is a type of scanning probe microscopy that can analyze topographic details of various specimens like ceramics, glass, polymers, and biological samples. AFM offers over 1000 times more resolution than the optical imaging system. Images generated from AFM are three-dimensional surface profiles, offering an advantage over the flat, two-dimensional images from other imaging techniques.
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Scanning Electron Microscopy01:07

Scanning Electron Microscopy

A scanning electron microscope (SEM) is used to study the surface features of a sample by using an electron beam that scans the sample surface in a two-dimensional manner. Typically, areas between ~1 centimeter to 5 micrometers in width can be imaged. SEM can be used to image bacteria, viruses, tissues as well as larger samples like insects. Conventional SEM gives a magnification ranging from 20X to 30,000X and spatial resolution of 50 to 100 nanometers.
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Overview of Microscopy Techniques01:22

Overview of Microscopy Techniques

The early pioneers of microscopy opened a window into the invisible world of microorganisms. In 1830, Joseph Jackson Lister created an essentially modern light microscope. The 20th century saw the development of microscopes that leveraged nonvisible light, such as fluorescence microscopy that uses an ultraviolet light source and electron microscopy that uses short-wavelength electron beams. These advances significantly improved magnification, image resolution, and contrast. By comparison, the...

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Atomically Traceable Nanostructure Fabrication
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Published on: July 17, 2015

A combined scanning tunneling microscope-atomic layer deposition tool.

James F Mack1, Philip B Van Stockum, Hitoshi Iwadate

  • 1Department of Mechanical Engineering, Stanford University, Stanford, California 94305, USA. jfmack@stanford.edu

The Review of Scientific Instruments
|January 10, 2012
PubMed
Summary
This summary is machine-generated.

A new combined Scanning Tunneling Microscope-Atomic Layer Deposition (STM-ALD) tool enables in situ imaging during deposition. This instrument allows for atomic-level observation and nanoscale fabrication, advancing materials science research.

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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

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Area of Science:

  • Materials Science and Engineering
  • Nanotechnology
  • Surface Science

Background:

  • Atomic Layer Deposition (ALD) is a crucial technique for thin-film fabrication.
  • In situ monitoring of ALD processes is essential for understanding and controlling film growth.
  • Current methods often lack the resolution or real-time feedback needed for precise control.

Purpose of the Study:

  • To develop and characterize a novel combined Scanning Tunneling Microscope-Atomic Layer Deposition (STM-ALD) instrument.
  • To enable real-time, in situ imaging of ALD processes at the atomic level.
  • To demonstrate the dual capability of the instrument for both observation and nanofabrication.

Main Methods:

  • Integration of an Atomic Layer Deposition (ALD) system with a Scanning Tunneling Microscope (STM).
  • Implementation of a passive vibration isolation system for enhanced stability.
  • Operation across a temperature range of room temperature to 200 °C and pressures from 1 × 10⁻⁶ to 1 × 10⁻² Torr.
  • Utilizing the STM tip to apply electric fields for lateral patterning during deposition.

Main Results:

  • Achieved atomic resolution STM imaging capabilities.
  • Demonstrated successful Atomic Layer Deposition (ALD) within the integrated system.
  • Successfully combined STM imaging and ALD for in situ characterization of deposition processes.
  • Showcased the instrument's potential as a nanofabrication tool through tip-induced patterning.

Conclusions:

  • The developed STM-ALD tool provides unprecedented in situ capabilities for studying thin-film growth.
  • This integrated approach allows for simultaneous observation and manipulation at the nanoscale.
  • The instrument opens new avenues for precise control and design of nanostructured materials.