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Water-developable poly(2-oxazoline)-based negative photoresists
Verena Schenk1, Lisa Ellmaier, Elisabeth Rossegger
1Polymer Competence Center Leoben GmbH PCCL, Leoben, Austria.
Macromolecular Rapid Communications
|January 20, 2012
Summary
New copoly(2-oxazoline) photoresists enable high-resolution patterning. These advanced materials, prepared rapidly using microwave synthesis, offer tunable properties and can be developed in environmentally friendly solvents, including water.
Area of Science:
- Polymer Chemistry
- Materials Science
- Photolithography
Background:
- Copoly(2-oxazoline)s are versatile polymers with tunable properties.
- Photoresists are critical materials in microfabrication for creating patterns.
Purpose of the Study:
- To develop novel copoly(2-oxazoline)-based photoresists.
- To investigate the synthesis and photopatterning capabilities of these new materials.
Main Methods:
- Synthesis of copoly(2-oxazoline)s with unsaturated side chains via microwave irradiation.
- Photopatterning using UV irradiation and thiol-ene click chemistry.
- Development using halogen-free solvents.
Main Results:
- Efficient decagram-scale synthesis of functionalized copoly(2-oxazoline)s in under 100 minutes.
- Successful photopatterning with a resolution of 2 μm via UV-induced thiol-ene reaction.
- Demonstration of development in halogen-free solvents, including water for specific formulations.
Conclusions:
- Copoly(2-oxazoline)-based photoresists offer a viable platform for high-resolution patterning.
- Microwave-assisted synthesis provides a rapid and scalable route to these materials.
- The use of environmentally friendly solvents enhances the sustainability of the photolithography process.
