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Water-developable poly(2-oxazoline)-based negative photoresists.

Verena Schenk1, Lisa Ellmaier, Elisabeth Rossegger

  • 1Polymer Competence Center Leoben GmbH PCCL, Leoben, Austria.

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New copoly(2-oxazoline) photoresists enable high-resolution patterning. These advanced materials, prepared rapidly using microwave synthesis, offer tunable properties and can be developed in environmentally friendly solvents, including water.

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Area of Science:

  • Polymer Chemistry
  • Materials Science
  • Photolithography

Background:

  • Copoly(2-oxazoline)s are versatile polymers with tunable properties.
  • Photoresists are critical materials in microfabrication for creating patterns.

Purpose of the Study:

  • To develop novel copoly(2-oxazoline)-based photoresists.
  • To investigate the synthesis and photopatterning capabilities of these new materials.

Main Methods:

  • Synthesis of copoly(2-oxazoline)s with unsaturated side chains via microwave irradiation.
  • Photopatterning using UV irradiation and thiol-ene click chemistry.
  • Development using halogen-free solvents.

Main Results:

  • Efficient decagram-scale synthesis of functionalized copoly(2-oxazoline)s in under 100 minutes.
  • Successful photopatterning with a resolution of 2 μm via UV-induced thiol-ene reaction.
  • Demonstration of development in halogen-free solvents, including water for specific formulations.

Conclusions:

  • Copoly(2-oxazoline)-based photoresists offer a viable platform for high-resolution patterning.
  • Microwave-assisted synthesis provides a rapid and scalable route to these materials.
  • The use of environmentally friendly solvents enhances the sustainability of the photolithography process.