Gold nanoparticle deposition on Si by destabilising gold colloid with HF

Gold nanoparticles from commercially available colloids were deposited onto a hydrogen-terminated silicon substrate without the use of a polyelectrolyte linker by the addition of HF acid. The deposition density was shown to be controlled over three orders of magnitude by varying the colloid concentration, and finer control is achieved by varying the deposition time. In order to minimise agglomeration, however, we show that deposition times should be minimised since nanoparticle agglomeration increases rapidly over the first 2 min after the addition of HF. To increase nanoparticle density without increasing agglomeration, we show that successive depositions of short times linearly increase the deposition density without increasing the agglomeration of nanoparticles.