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Updated: May 25, 2026

Quantitative Characterization of Liquid Photosensitive Bioink Properties for Continuous Digital Light Processing Based Printing

Quantitative Characterization of Liquid Photosensitive Bioink Properties for Continuous Digital Light Processing Based Printing

Published on: April 14, 2023

Two-photon continuous flow lithography.

Simona C Laza¹, Marco Polo, Antonio A R Neves

¹National Nanotechnology Laboratory of Istituto Nanoscienze-CNR, Università del Salento, via Arnesano, Lecce, Italy.

Advanced Materials (Deerfield Beach, Fla.)

|February 4, 2012

Summary

This summary is machine-generated.

A novel two-photon continuous flow lithography method enables microfluidics-based production of 3D polymeric particles. This technique overcomes traditional limitations, creating sub-micrometer structures with high resolution and smooth surfaces.

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Area of Science:

Materials Science
Chemical Engineering
Nanotechnology

Background:

Traditional two-photon lithography has limitations in production speed and scalability.
Microfluidics offers precise control for material synthesis.

Purpose of the Study:

To report a new microfluidics-based method for polymeric particle production.
To overcome limitations of traditional two-photon lithography.

Main Methods:

Utilizing two-photon lithography with multiple beams under continuous flow.
Implementing microfluidics for controlled particle synthesis.

Main Results:

Demonstrated production of polymeric fibers, helical, and bow-tie particles.
Achieved sub-micrometer and 3D features with sub-diffraction resolution.
Obtained surface roughness as low as 10 nm.

Conclusions:

Two-photon continuous flow lithography is a viable technique for advanced polymeric particle fabrication.
The method allows for precise control over particle morphology and surface properties.