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Updated: May 24, 2026

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Analysis of the H- ion emissive surface in the extraction region of negative ion sources
N Kameyama1, T Fukuyama, S Wada
1Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama, 223-8522, Japan.
Abstract:
To understand the plasma characteristics in the extraction region of negative H(-) sources is very important for the optimization of H(-) extraction from the sources. The profile of plasma density and electrostatic potential in the extraction region with and without extraction grid voltage are analyzed with a 2D particle in cell modeling of the NIFS-RD H(-) sources. The simulation results make clear the physical process forming a double ion plasma layer (which consists only of positive H(+) and negative H(-) ions) recently observed in the Cs-seeded experiments of the NIFS-R&D source in the vicinity of the extraction hole and the plasma grid. The results also give a useful insight into the formation mechanism of the plasma meniscus and the H(-) extraction process for such double ion plasma.
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