Related Experiment Video
Updated: May 24, 2026

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
Published on: February 8, 2022
Hollow target magnetron-sputter-type solid material ion source
1Graduate School of Engineering, Doshisha University, Kyoto 610-0321, Japan.
Abstract:
A thin-walled aluminum (Al) hollow electrode has been inserted into an ion source to serve as an electrode for a radio frequency magnetron discharge. The produced plasma stabilized by argon (Ar) gas sputters the Al electrode to form a beam of Al(+) and Ar(+) ions. The total beam current extracted through a 3 mm diameter extraction hole has been 50 μA, with the Al(+) ion beam occupying 30% of the total beam current.
Related Concept Videos
Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview
Atomic Emission Spectroscopy: Instrumentation

