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Compact microwave ion source for industrial applications.

Yong-Sub Cho1, Dae-Il Kim, Han-Sung Kim

  • 1Proton Engineering Frontier Project, Korea Atomic Energy Research Institute, Daejeon 305-353, South Korea. choys@keari.re.kr

The Review of Scientific Instruments
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Summary

A novel microwave ion source for ion implanters offers a compact, cost-effective solution for industrial applications. This design eliminates high-voltage components, simplifying operation and reducing space requirements for ion beam systems.

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Area of Science:

  • Physics
  • Engineering
  • Materials Science

Background:

  • Microwave ion sources are crucial for industrial ion implantation.
  • Existing designs often require bulky and expensive high-voltage components.
  • Compactness and cost-effectiveness are key for industrial adoption.

Purpose of the Study:

  • To develop a compact and cost-effective microwave ion source for ion implanters.
  • To eliminate the need for high-voltage decks and isolation transformers.
  • To enable precise dose rate control using semiconductor switches.

Main Methods:

  • Utilized a permanent magnet solenoid to replace the traditional dc current supply.
  • Implemented a multi-layer dc break to isolate high-voltage components.
  • Employed pulse duty control with a semiconductor high-voltage switch for dose rate regulation.

Main Results:

  • Successfully eliminated the high-voltage deck and high-voltage isolation transformer.
  • Achieved dose rate control via pulse duty modulation.
  • Demonstrated reduced budget and space requirements.
  • Maintained beam optics without additional transfer components.

Conclusions:

  • The developed microwave ion source is suitable for industrial ion implantation due to its compact size and reduced cost.
  • The design simplifies maintenance and enhances operational efficiency.
  • This innovation addresses key industrial demands for ion beam technology.