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Updated: Apr 28, 2026

How to Ignite an Atmospheric Pressure Microwave Plasma Torch without Any Additional Igniters
Published on: April 16, 2015
Compact microwave ion source for industrial applications
Yong-Sub Cho1, Dae-Il Kim, Han-Sung Kim
1Proton Engineering Frontier Project, Korea Atomic Energy Research Institute, Daejeon 305-353, South Korea. choys@keari.re.kr
Abstract:
A 2.45 GHz microwave ion source for ion implanters has many good properties for industrial application, such as easy maintenance and long lifetime, and it should be compact for budget and space. But, it has a dc current supply for the solenoid and a rf generator for plasma generation. Usually, they are located on high voltage platform because they are electrically connected with beam extraction power supply. Using permanent magnet solenoid and multi-layer dc break, high voltage deck and high voltage isolation transformer can be eliminated, and the dose rate on targets can be controlled by pulse duty control with semiconductor high voltage switch. Because the beam optics does not change, beam transfer components, such as focusing elements and beam shutter, can be eliminated. It has shown the good performances in budget and space for industrial applications of ion beams.
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