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Updated: May 24, 2026

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Tunnel field-effect transistors based on InP-GaAs heterostructure nanowires
Bahram Ganjipour1, Jesper Wallentin, Magnus T Borgström
1Division of Solid State Physics, Lund University, Box 118, S-22100, Lund, Sweden. bahram.ganjipour@ftf.lth.se
Abstract:
We present tunneling field-effect transistors fabricated from InP-GaAs heterostructure nanowires with an n-i-p doping profile, where the intrinsic InP region is modulated by a top gate. The devices show an inverse subthreshold slope down to 50 mV/dec averaged over two decades with an on/off current ratio of approximately 10(7) for a gate voltage swing (V(GS)) of 1 V and an on-current of 2.2 μA/μm. Low-temperature measurements suggest a mechanism of trap-assisted tunneling, possibly explained by a narrow band gap segment of InGaAsP.
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