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Updated: May 24, 2026
Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
Published on: December 4, 2014
Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown
Jere Tupala1, Marianna Kemell, Emma Härkönen
1Department of Chemistry, FI-00014 University of Helsinki, PO Box 55, Finland. jere.tupala@helsinki.fi
Abstract:
Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.
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