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Published on: February 5, 2020
3D nanofluidic channels shaped by electron-beam-induced etching.
John M Perry1, Zachary D Harms, Stephen C Jacobson
1Department of Chemistry, Indiana University, 800 E. Kirkwood Ave., Bloomington, IN 47405-7102, USA.
Small (Weinheim an Der Bergstrasse, Germany)
|March 15, 2012
Summary
Electron beam lithography and etching fabricated in-plane nanofluidic channels. This technique precisely shaped nano-funnels, reducing their dimensions for advanced microfluidic applications.
Area of Science:
- Nanotechnology
- Microfluidics
- Materials Science
Background:
- Fabrication of in-plane nanofluidic channels is crucial for advanced microfluidic devices.
- Achieving precise 3D topography in nanochannels presents significant fabrication challenges.
Purpose of the Study:
- To develop a method for fabricating in-plane nanofluidic channels with controlled 3D topography.
- To demonstrate the precise shaping of nanochannel features using electron-beam-induced etching.
Main Methods:
- Utilized electron beam lithography to create nanochannel masters in SU-8 resist.
- Employed electron-beam-induced etching (EBIE) with water as the precursor gas to shape the masters.
- Fabricated nanofunnel replicas from both unmodified and EBIE-modified masters.
Main Results:
- Successfully fabricated in-plane nanofluidic channels with defined 3D topography.
- Demonstrated significant reduction in nanofunnel tip dimensions via EBIE.
- Achieved funnel tip dimensions reduced from 150-nm depth/80-nm width to 70-nm depth/40-nm width.
Conclusions:
- Electron beam-induced etching offers precise control over 3D topography in nanofluidic channels.
- The developed fabrication method enables the creation of miniaturized nano-features for microfluidic applications.
- This technique holds potential for advancing the design and functionality of nanoscale devices.
