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Updated: May 23, 2026
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Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
Published on: January 23, 2013
Tailoring nanostructures using copolymer nanoimprint lithography
Pascal Thébault1, Stefan Niedermayer, Stefan Landis
1CEA, IRAMIS, SIS2M LIONS, CNRS, UMR n° 3299, Gif-sur-Yvette Cedex, France.
Advanced Materials (Deerfield Beach, Fla.)
|March 22, 2012
Abstract:
The generation of defect-free polymer nanostructures by nanoimprinting methods is described. Long-range nanorheology and shorter-range surface energy effects can be efficiently combined to provide alignment of copolymer lamellae over several micrometers. As an example, a perpendicular organization with respect to circular tracks is shown, demonstrating the possibility of writing ordered radial nanostructures over large distances.
