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Updated: May 23, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
T Low1, V Perebeinos, J Tersoff
1IBM T. J. Watson Research Center, Yorktown Heights, New York 10598, USA.
Substrate steps significantly impact graphene's electrical resistance. Calculations show doping changes near steps, not just deformation, explain experimental resistance measurements in epitaxial graphene on silicon carbide.
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