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Updated: May 23, 2026
Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
High-fidelity chemical patterning on oxide-free germanium
J Nathan Hohman1, Moonhee Kim, Jeffrey A Lawrence
1California NanoSystems Institute and Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, CA 90095, USA.
Abstract:
Oxide-free germanium can be chemically patterned directly with self-assembled monolayers of n-alkanethiols via submerged microcontact printing. Native germanium dioxide is water soluble; immersion activates the germanium surface for self-assembly by stripping the oxide. Water additionally provides an effective diffusion barrier that prevents undesired ink transport. Patterns are stable with respect to molecular exchange by carboxyl-functionalized thiols.
