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Updated: May 23, 2026

Optical Trapping of Nanoparticles
13:39

Optical Trapping of Nanoparticles

Published on: January 15, 2013

Parallel optical trap assisted nanopatterning on rough surfaces.

Y C Tsai1, K H Leitz, R Fardel

  • 1Department of Mechanical and Aerospace Engineering, Princeton Institute for Science and Technology of Materials, Princeton University, Princeton, NJ 08544, USA.

Nanotechnology
|April 4, 2012
PubMed
Summary
This summary is machine-generated.

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Optical trap assisted nanopatterning (OTAN) enables direct-write nanolithography on challenging surfaces. This technique achieves high precision for nanoscale feature creation on soft materials and structured surfaces.

Area of Science:

  • Nanotechnology
  • Optical Engineering
  • Materials Science

Background:

  • Traditional optical lithography excels on flat, hard surfaces.
  • Patterning soft materials or surfaces with existing structures remains a challenge.
  • Need for adaptable nanolithography techniques for diverse substrates.

Purpose of the Study:

  • To demonstrate parallel optical trap assisted nanopatterning (OTAN) for direct-write nanolithography.
  • To address limitations of existing techniques on non-traditional surfaces.
  • To achieve efficient and robust nanoscale feature generation.

Main Methods:

  • Utilized parallel optical trap assisted nanopatterning (OTAN).
  • Applied technique to model polyimide surfaces with vertical steps > 1.5 µm.

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Patterning via Optical Saturable Transitions - Fabrication and Characterization
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Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

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Last Updated: May 23, 2026

Optical Trapping of Nanoparticles
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Optical Trapping of Nanoparticles

Published on: January 15, 2013

Optical Trapping of Plasmonic Nanoparticles for In Situ Surface-Enhanced Raman Spectroscopy Characterizations
06:19

Optical Trapping of Plasmonic Nanoparticles for In Situ Surface-Enhanced Raman Spectroscopy Characterizations

Published on: June 23, 2022

Patterning via Optical Saturable Transitions - Fabrication and Characterization
08:19

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

  • Employed a Brownian motion model to analyze positional accuracy.

    • Main Results:

    • Achieved feature size uncertainty < 4% across surface steps.
    • Demonstrated lateral positional accuracy of 25 nm.
    • Validated OTAN's effectiveness without focal plane adjustment.

    Conclusions:

    • OTAN is a viable technique for massively parallel direct-write nanolithography.
    • The method is robust for patterning non-traditional surfaces.
    • Brownian motion model aids in predicting and optimizing nanopatterning outcomes.