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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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Oxidation of bisphenol A by UV/S2O8(2-): comparison with UV/H2O2

Sung-Hwan Yoon1, Seongpil Jeong, Seockheon Lee

  • 1Water Environmental Centre, Korea Institute of Science and Technology (KIST), 39-1 Hawolgok-dong, Seongbuk-gu, Seoul 136-791, Republic of Korea.

Environmental Technology
|April 24, 2012
PubMed

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