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Fabrication of Silica Ultra High Quality Factor Microresonators
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Fabrication of Silica Ultra High Quality Factor Microresonators

Published on: July 2, 2012

Azimuthal-order variations of surface-roughness-induced mode splitting and scattering loss in high-Q microdisk

Qing Li1, Ali A Eftekhar, Zhixuan Xia

  • 1School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, USA.

Optics Letters
|May 5, 2012
PubMed

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