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Updated: May 21, 2026

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
09:18

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Published on: February 8, 2022

Electrical nano-imprint lithography.

L Ressier1, E Palleau, S Behar

  • 1Université de Toulouse, LPCNO, INSA-CNRS-UPS, 135 avenue de Rangueil, Toulouse, France. laurence.ressier@insa-toulouse.fr

Nanotechnology
|June 2, 2012
PubMed
Summary
This summary is machine-generated.

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We developed electrical nano-imprint lithography (e-NIL) to create nanoscale patterns with both topography and electrical charge in polymer films. This technique enables high-throughput directed assembly of nanoparticles for advanced material applications.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Patterning materials at the nanoscale is crucial for advanced applications.
  • Existing techniques often lack simultaneous control over topography and electrical properties.

Purpose of the Study:

  • To introduce a novel technique, electrical nano-imprint lithography (e-NIL), for simultaneous topographic and electrostatic patterning.
  • To demonstrate the fabrication of charged nanostructures for directed assembly applications.

Main Methods:

  • Utilized e-NIL to transfer micro/nano-patterns from a conductive mold into thermoplastic electret films.
  • Simultaneously injected electrical charges into the imprinted patterns.
  • Fabricated patterned polymethylmethacrylate (PMMA) films on silicon wafers.

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Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

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Last Updated: May 21, 2026

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
09:18

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers

Published on: February 8, 2022

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
13:49

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Published on: January 19, 2020

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Main Results:

  • Successfully created arrays of 5 μm and 300 nm wide topographic charged patterns.
  • Demonstrated the creation of thousands of topographically confined and electrostatically active sites.
  • Showcased the utility of patterned films for high-throughput directed assembly of colloidal nanoparticles.

Conclusions:

  • e-NIL is a versatile parallel process for nanoscale patterning of electret films.
  • The fabricated patterned films are effective for directed nanoparticle assembly.
  • This technique opens new avenues for creating functional nanostructured materials.