Related Experiment Video
Updated: May 21, 2026
07:39
Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
Published on: July 21, 2018
SPPs coupling induced interference in metal/dielectric multilayer waveguides and its application for plasmonic
Peng Zhu1, Haofei Shi, L Jay Guo
1Department of Electrical Engineering and Computer Science, C-PHOM, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109, USA.
Optics Express
|June 21, 2012
Summary
We analyzed surface plasmon polaritons (SPPs) coupling in metamaterials to enhance plasmonic lithography. This research offers design guidelines for achieving sub-wavelength patterns with high contrast and large image depth.
Area of Science:
- Photonics and Nanotechnology
- Metamaterials Science
- Lithography Techniques
Background:
- Surface plasmon polaritons (SPPs) are crucial for sub-wavelength optical phenomena.
- Metal/dielectric (M/D) multilayer metamaterials offer unique optical properties.
- Plasmonic lithography promises high-resolution patterning beyond the diffraction limit.
Purpose of the Study:
- To analyze SPP coupling-induced interference in M/D multilayer metamaterials.
- To develop techniques for improving sub-wavelength plasmonic lithography performance.
- To provide design guidelines for high-resolution patterning.
Main Methods:
- Coupled mode theory for analyzing SPP interference.
- Numerical simulations to derive beam spreading angles and interference patterns.
- Investigation of SPP coupling within photoresist materials.
Main Results:
- Sub-wavelength uniform periodic patterns with feature sizes down to 1/12 of the mask period were realized through optimized layer design.
- High pattern contrast (0.8) and a large field depth (80 nm) were numerically demonstrated.
- Understanding SPP coupling effects in photoresist is key to achieving high-quality patterns.
Conclusions:
- The study provides crucial insights into SPP coupling for advanced plasmonic lithography.
- Optimized M/D metamaterial structures enable high-fidelity sub-wavelength pattern transfer.
- Achieving high contrast and large image depth is vital for practical plasmonic lithography applications.
