Formation of gradient multiwalled carbon nanotube stripe patterns by using evaporation-induced self-assembly

Gradient stripe patterns of multiwalled carbon nanotubes (MWCNTs) with remarkable regularity over large areas were fabricated by using evaporation-induced self-assembly technique. In this method, a glass coverslip was inclinedly immersed into a suspension of MWCNTs in dichloroethane. By controlling the solvent evaporation temperature, well-defined gradient stripes were formed at the air-solvent-substrate contact line. The effects of several experimental parameters, such as the substrate tilt angle, concentration of MWCNTs, and evaporation temperature, on the regularity of stripes were discussed. A possible stripe formation process was described as a negative feedback of MWCNT concentration caused by a concavely curved shape of the meniscus. Additionally, the strips of MWCNTs on Si/SiO(2) substrate were directly used to fabricate field-effect transistor (FET) devices. The electrical properties of the MWCNT-FET devices were also investigated.