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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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Mixed-valence uranium germanate and silicate: Cs(x)(U(V)O)(U(IV/V)O)2(Ge2O7)2 (x = 3.18) and

Chun-Liang Chen1, Quang Bac Nguyen, Chih-Shan Chen

  • 1Department of Chemistry, National Central University, Jhongli, Taiwan 320, Republic of China.

Inorganic Chemistry
|July 7, 2012
PubMed

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