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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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Stability and migration of large oxygen clusters in UO(2+x): density functional theory calculations

D A Andersson1, F J Espinosa-Faller, B P Uberuaga

  • 1Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA. andersson@lanl.gov

The Journal of Chemical Physics
|July 12, 2012
PubMed

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