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Plasmonic color filters for CMOS image sensor applications.

Sozo Yokogawa1, Stanley P Burgos, Harry A Atwater

  • 1Thomas J. Watson Laboratories of Applied Physics, California Institute of Technology, Pasadena, California 91125, USA. sozo@caltech.edu

Nano Letters
|July 18, 2012
PubMed
Summary

Plasmonic hole arrays function as effective color filters for silicon CMOS image sensors. These filters maintain performance across various pixel sizes and are robust against defects and crosstalk.

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Area of Science:

  • Optics and Photonics
  • Materials Science
  • Nanotechnology

Background:

  • Plasmonic color filters are crucial for advanced Si CMOS image sensors.
  • Subwavelength hole arrays on aluminum films offer potential for color filtering applications.

Purpose of the Study:

  • To investigate the optical properties of plasmonic hole arrays for color filter applications.
  • To assess the performance of these filters for state-of-the-art Si CMOS image sensors.

Main Methods:

  • Fabrication of hexagonally packed subwavelength hole arrays on a 150 nm Al film.
  • Characterization of transmission properties for red, green, and blue primary colors.
  • Analysis of filter performance across different pixel sizes and in the presence of defects.

Main Results:

  • Hole array plasmonic filters achieve 40-50% peak transmission for large filters (>5 × 5 μm²).
  • Filtering function is maintained for pixel sizes down to ~1 × 1 μm², with reduced transmission efficiency.
  • Filters demonstrate robustness against spatial crosstalk and random defects.

Conclusions:

  • Nearest neighbor hole-hole interactions predominantly influence transmission properties.
  • A simple nearest neighbor model accurately predicts filter transmission efficiency.
  • Plasmonic hole arrays are a viable technology for high-performance color filters in CMOS image sensors.