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Updated: May 19, 2026

Fabrication and Characterization of High-Q Silicon Nitride Membrane Resonators
Published on: August 8, 2025
Trimming of high-Q-factor silicon ring resonators by electron beam bleaching
Stefan Prorok1, Alexander Yu Petrov, Manfred Eich
1Institute of Optical and Electronic Materials, Hamburg University of Technology, Hamburg, Germany. stefan.prorok@tu‑harburg.de
Abstract:
We demonstrate a novel position-resolved resonance trimming strategy for silicon ring resonators. Ring resonators are covered with a chromophore-doped guest host polymer cladding. Illumination of the polymer cladding with high-energy electrons causes a bleaching of the chromophore molecules. Bleaching of the chromophores induces a reduction of the polymer refractive index, which can be used to trim the resonance frequency of the ring resonators. A maximum refractive index change of 0.06 and a TM polarization resonance shift of 16.4 nm have been measured. A Q factor of 20,000 before bleaching remains unaltered after the electron beam exposure process.

