Sensitivity analysis of thin-film thickness measurement by vertical scanning white-light interferometry

The spectral nonlinear phase method and the Fourier amplitude method have been applied to measure the thin-film thickness profile in vertical scanning white-light interferometry (VSWLI). However, both the methods have their disadvantages, and accordingly their applications are limited. In the paper we have investigated the dependence of the sensitivities of both the methods on the thin-film thickness and refractive index, the objective numerical aperture, and the incident light spectral range of VSWLI. The relation of the Fresnel reflection coefficients on the wavelength effect is also discussed. Some important research results reveal that the combination of both Fourier amplitude and nonlinear phase methods may provide a new approach to improve the VSWLI measurement sensitivity for thin-film thickness profile.