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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
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AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...

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Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
07:39

Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons

Published on: July 21, 2018

Simultaneous surface plasmon resonance and x-ray absorption spectroscopy.

A Serrano1, O Rodríguez de la Fuente, V Collado

  • 1Instituto de Cerámica y Vidrio (ICV-CSIC), Cantoblanco, 28049 Madrid, Spain. aida.serrano@icv.csic.es

The Review of Scientific Instruments
|September 4, 2012
PubMed
Summary

We developed a new experimental setup for simultaneous surface plasmon resonance (SPR) and x-ray absorption spectroscopy (XAS) measurements. This allows real-time study of x-ray interactions with metallic films and surface plasmon effects.

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Area of Science:

  • Materials Science
  • Surface Science
  • Spectroscopy

Background:

  • Surface plasmon resonance (SPR) and X-ray absorption spectroscopy (XAS) are powerful techniques for material characterization.
  • Simultaneous measurements can provide complementary information and reveal complex interactions.

Purpose of the Study:

  • To present a novel experimental setup for simultaneous SPR and XAS measurements.
  • To investigate the in situ and real-time effects of X-ray irradiation on metallic thin films.
  • To explore the influence of surface plasmon excitation on material properties.

Main Methods:

  • Integration of SPR and XAS measurement capabilities at a synchrotron beamline.
  • Development of a system for simultaneous data acquisition.
  • In situ and real-time monitoring of metallic thin films under X-ray irradiation and surface plasmon excitation.

Main Results:

  • The setup enables simultaneous measurement of SPR and XAS spectra.
  • It allows real-time observation of X-ray-induced changes in SPR curves.
  • The system can record XAS spectra during SPR excitation to study plasmon-induced modifications.
  • Simultaneous data acquisition under varying experimental parameters is feasible.
  • Detection limits for spectral variations are as low as 10(-3) to 10(-5).

Conclusions:

  • The developed experimental setup facilitates combined SPR and XAS studies on metallic thin films.
  • This approach offers new possibilities for investigating X-ray-matter interactions and surface plasmon phenomena.
  • The high sensitivity of the system allows for detailed analysis of subtle spectral changes.