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Tailored star block copolymer architecture for high performance chemically amplified resists
Florian Wieberger1, Christian Neuber, Christopher K Ober
1Makromolekulare Chemie I, Bayreuther Institut für Makromolekülforschung (BIMF) and Bayreuther Zentrum für Kolloide und Grenzflächen (BZKG), Universität Bayreuth, 95440 Bayreuth, Germany.
Advanced Materials (Deerfield Beach, Fla.)
|September 11, 2012
Summary
Star block copolymers offer high-performance resist materials with improved sensitivity and solubility contrast. Optimized through combinatorial methods, they achieve 66 nm line/space patterns, showcasing advanced polymer synthesis for microelectronics.
Area of Science:
- Polymer Chemistry
- Materials Science
- Nanotechnology
Background:
- Resist materials are crucial for photolithography in microelectronics fabrication.
- Existing resist materials face challenges in achieving high resolution and sensitivity.
- Block copolymers offer tunable properties for advanced material applications.
Purpose of the Study:
- To develop and evaluate star block copolymers as high-performance resist materials.
- To enhance sensitivity and solubility contrast in resist formulations.
- To achieve high-resolution patterning for microelectronic applications.
Main Methods:
- Synthesis of star block copolymers using a core-first atom transfer radical polymerization (ATRP) method.
- Combinatorial optimization of the resist material composition.
- Characterization of resist performance, including sensitivity, solubility contrast, and pattern resolution.
Main Results:
- Demonstrated star block copolymers as effective high-performance resist materials.
- Achieved significant advancements in sensitivity and solubility contrast.
- Successfully fabricated a 66 nm line/space pattern through combinatorial optimization.
- Synthesized polymers with narrow polydispersity indices (below 1.2) via ATRP.
Conclusions:
- Tailored molecular architecture of star block copolymers leads to superior resist performance.
- The developed resist material shows great potential for next-generation microelectronics fabrication.
- Atom transfer radical polymerization is a viable method for synthesizing well-defined block copolymers for advanced applications.