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Updated: May 18, 2026

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
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Pitch-tunable size reduction patterning with a temperature-memory polymer.

Won-Gyu Bae1, Jae Hoon Choi, Kahp Y Suh

  • 1Department of Mechanical and Aerospace Engineering, Seoul National University, Seoul 151-742, Korea.

Small (Weinheim an Der Bergstrasse, Germany)
|September 22, 2012
PubMed
Summary
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This study presents a scalable method for size reduction patterning using the temperature memory effect of shape memory polymers and UV-curable materials. This technique allows for tunable pitch and size control in microfabrication.

Area of Science:

  • Materials Science
  • Polymer Science
  • Nanotechnology

Background:

  • Existing size reduction patterning methods face challenges in scalability and tunability.
  • Shape memory polymers (SMPs) offer unique thermo-responsive properties.
  • Replica molding is a versatile technique for micro- and nanofabrication.

Purpose of the Study:

  • To develop a scalable and pitch-tunable size reduction patterning method.
  • To leverage the temperature memory effect of shape memory polymers for precise patterning.
  • To utilize UV-curable materials in conjunction with SMPs for pattern replication.

Main Methods:

  • Exploiting the temperature memory effect of shape memory polymers.
  • Employing replica molding with UV-curable materials.

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Last Updated: May 18, 2026

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Published on: July 2, 2012

Shape Memory Polymers for Active Cell Culture
10:53

Shape Memory Polymers for Active Cell Culture

Published on: July 4, 2011

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07:38

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Published on: January 8, 2014

  • Developing a process for scalable and pitch-tunable patterning.

    • Main Results:

    • Demonstrated a scalable size reduction patterning technique.
    • Achieved pitch-tunability in the patterned structures.
    • Successfully replicated patterns using UV-curable materials.

    Conclusions:

    • The developed method offers a novel approach for scalable and tunable size reduction patterning.
    • This technique has potential applications in microelectronics, photonics, and biomedical devices.
    • The combination of SMPs and replica molding provides a versatile platform for advanced material patterning.