Subtractive patterning via chemical lift-off lithography

Wei-Ssu Liao1, Sarawut Cheunkar, Huan H Cao

  • 1California NanoSystems Institute, University of California, Los Angeles, CA 90095, USA.

Science (New York, N.Y.)
|September 22, 2012
PubMed
Summary

This study introduces a subtractive stamping method using plasma-activated silicone stamps to precisely remove molecular layers from surfaces. This technique overcomes resolution limits for creating high-fidelity nanoscale chemical patterns.

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