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Updated: May 18, 2026
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Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates
Published on: January 17, 2018
Initiated chemical vapor deposition-based method for patterning polymer and metal microstructures on curved
Christy D Petruczok1, Karen K Gleason
1Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.
Advanced Materials (Deerfield Beach, Fla.)
|September 27, 2012
Abstract:
A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.
