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Updated: May 18, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Published on: January 19, 2020

Nano-structuring, surface and bulk modification with a focused helium ion beam.

Daniel Fox¹, Yanhui Chen, Colm C Faulkner

¹School of Physics and CRANN, Trinity College Dublin, Dublin 2, Republic of Ireland.

Beilstein Journal of Nanotechnology

|September 29, 2012

Summary

This summary is machine-generated.

Focused helium ion beams precisely mill and modify materials, reducing surface roughness and enabling high-acuity fabrication. This technique preserves subsurface structures for detailed analysis and reveals helium implantation effects.

Keywords:

EELS EFTEM TEM helium ion microscopy nanofabrication

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Published on: July 14, 2022

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Last Updated: May 18, 2026

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Published on: January 19, 2020

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Published on: July 17, 2015

Nanoscale Characterization of Liquid-Solid Interfaces by Coupling Cryo-Focused Ion Beam Milling with Scanning Electron Microscopy and Spectroscopy

Nanoscale Characterization of Liquid-Solid Interfaces by Coupling Cryo-Focused Ion Beam Milling with Scanning Electron Microscopy and Spectroscopy

Published on: July 14, 2022

Area of Science:

Materials Science
Nanotechnology
Surface Science

Background:

Precise material modification is crucial for advanced nanotechnology.
Existing methods lack the sub-nanometer control required for intricate surface patterning.

Purpose of the Study:

To investigate the material modification and milling capabilities of a focused helium ion beam.
To explore the potential for high-resolution surface patterning and subsurface analysis.

Main Methods:

Utilized a helium ion microscope with a sub-nanometer probe for focused irradiation.
Irradiated silicon lamella at high incidence angles to induce surface modification.
Analyzed cross-sections to visualize helium implantation and structural effects.

Main Results:

Achieved selective surface material removal, preserving subsurface integrity.
Reduced surface roughness and removed contaminants.
Demonstrated high-acuity patterning and visualized helium implantation effects.
Observed the impact of irradiation on the material's crystal structure.

Conclusions:

Focused helium ion beams offer unprecedented control for material modification and nanofabrication.
The technique is effective for surface smoothing, contaminant removal, and high-resolution patterning.
Enables in-situ analysis of irradiation effects and subsurface structural preservation.