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Related Concept Videos

Scanning Electron Microscopy01:07

Scanning Electron Microscopy

A scanning electron microscope (SEM) is used to study the surface features of a sample by using an electron beam that scans the sample surface in a two-dimensional manner. Typically, areas between ~1 centimeter to 5 micrometers in width can be imaged. SEM can be used to image bacteria, viruses, tissues as well as larger samples like insects. Conventional SEM gives a magnification ranging from 20X to 30,000X and spatial resolution of 50 to 100 nanometers.
Fundamental Principles
Accelerated...
Overview of Electron Microscopy01:25

Overview of Electron Microscopy

The wavelengths of visible light ultimately limit the maximum theoretical resolution of images created by light microscopes. Most light microscopes can only magnify 1000X, and a few can magnify up to 1500X. Electrons, like electromagnetic radiation, can behave like waves, but with wavelengths of 0.005 nm, they produce significantly greater resolution up to 0.05 nm as compared to 500 nm for visible light. An electron microscope (EM) can create a sharp image that is magnified up to 2,000,000X.
Preparation of Samples for Electron Microscopy01:20

Preparation of Samples for Electron Microscopy

To be visualized by an electron microscope, either transmission or scanning, biological samples need to be fixed (stabilized) so the electron beam does not destroy them and dried thoroughly (desiccated/dehydrated) so the vacuum does not affect them. Fixation needs to be done as quickly as possible because the sample properties will start changing as soon as it is removed from its natural environment. For example, in a tissue sample, the oxygen levels begin decreasing, causing an altered...
Transmission Electron Microscopy01:15

Transmission Electron Microscopy

In 1931, physicist Ernst Ruska—building on the idea that magnetic fields can direct an electron beam just as lenses can direct a beam of light in an optical microscope—developed the first prototype of the electron microscope. This development led to the development of the field of electron microscopy. In the transmission electron microscope (TEM), electrons are produced by a hot tungsten element and accelerated by a potential difference in an electron gun, which gives them up to 400 keV in...
Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...

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Related Experiment Video

Updated: May 18, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
08:12

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures

Published on: December 5, 2015

Focused electron beam induced deposition: A perspective.

Michael Huth1, Fabrizio Porrati, Christian Schwalb

  • 1Physikalisches Institut, Max-von-Laue-Str. 1, Goethe-Universität, 60438 Frankfurt am Main, Germany.

Beilstein Journal of Nanotechnology
|September 29, 2012
PubMed
Summary
This summary is machine-generated.

Focused electron beam induced deposition (FEBID) enables nanometer-scale fabrication of advanced materials. This technique is evolving for applications in charge transport, sensing, and multicomponent systems, with future potential in electron-controlled chemistry.

Keywords:
atomic force microscopybinary systemselectron beam induced depositiongranular metalsmicro Hall magnetometryradiation-induced nanostructuresstrain sensing

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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
06:58

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Published on: July 12, 2016

Area of Science:

  • Materials Science
  • Nanotechnology
  • Physics

Background:

  • Focused electron beam induced deposition (FEBID) is a high-resolution direct-writing technique gaining prominence.
  • FEBID utilizes an electron beam to dissociate adsorbed precursors on a substrate for nanoscale fabrication.
  • The technique is maturing for applications in basic and applied research.

Purpose of the Study:

  • To review recent advancements in FEBID for nanometer-scale material synthesis.
  • To highlight applications in charge transport, sensing, and multicomponent systems.
  • To discuss the future prospects of FEBID, including electron-controlled chemistry.

Main Methods:

  • Review of FEBID of Pt-Si alloys and Co-Pt intermetallic compounds.
  • Analysis of growth processes using a continuum model with rate equations.
  • Investigation of charge transport in nanogranular metals and post-growth irradiation treatments.

Main Results:

  • Tunable composition of Co-Pt systems by controlling electron beam dwell time.
  • Demonstration of continuous tuning of electronic intergrain-coupling strength in Pt-C structures via irradiation.
  • Highlighting FEBID's utility in strain-sensing and magnetic field detection.

Conclusions:

  • FEBID has matured, enabling new applications in research and industry.
  • Further development is needed to realize FEBID's potential for electron-controlled nanochemistry.
  • Future research should focus on steering electron-induced reactions for controlled material synthesis.